Plasma Quest - Advanced Sputtering / Thin Film TechnologyDemonstrating control of remote plasma generation for the sputtering (physical vapour / vapor deposition) process
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Plasma Quest - next generation thin film deposition/sputtering technology
The Plasma Quest Ltd HiTUS patented remotely generated plasma thin film deposition technology is a major evolution from the traditional magnetron technology widely used in industrial and research circles.
Below is a film showing a curved plasma beam, which demonstrates Plasma Quest's ability to control the plasma generation process, one of the major reasons this technology offers possibilities never before possible in the thin film industry.